Wafer etching systems

Wafer etching systems for e.g. GaN on Sapphire etching are standard products.

We offer glass reactors with electrical heater and stirring system. Reactor size is up to 100 l.

The systems are offered with different etching bathes and rinsing basins.

Please contact us for further details.


Wafer_etching Wafer_etching  
GaN etching reactors (2) made from glass with a 50 l phosphoric acid bath including heater and stirner.
The reactor has a leacage drum underneath.
In front of each reactor is a demi-water basin placed, to wash the etched substrates.