We offer a wide range of custom-made, standard tube furnaces and box furnaces.
The temperature range is 1000°C to 1750°C for resistance heater.
On request we can offer also furnaces up to 2850°C with induction heating.
Contact us for further informations!
Arc furnace puller ...
Switch board for
a 500 kg MgO furnace
... for the production of MgO and other high melting oxides are produced up to 1000 kg load.
These furnaces are trible arc systems witch electrode movement system and super cooled outer crucible.
Inside main crucible is made from high quality fire bricks material pending on crystal raw materials requested.
These machenes are equipped with magneto electricel amplifiers to steer the current of up to 10000 Ampere. Crystals can be collected out of the bulk up to 3 x 3 inch.
500 kg MgO melting furnace witch 3 phase electrodes and intensive cooling system
50 kg MgO lab furnace (open system)
Chemical Melting Reactor
Custom made hightemperature, induction heated chemical reactors are offered.
We produce these items in small to large scale. The crucibles are water cooled and made out of metal, which will not come in contact with the melt, only with the powder filled into the crucible.
The Chamber can be used with different gasses or vacuum. Several ports are standard and can be added in the final design.
Also special tools are offered as ceramic pistils and steam condensers.
Window materials of the view ports are quartz, sapphire or special glasses.
V2A Reactor chamber
Cold crucible with coil
and dust adsorber
V2A Reactor chamber
Czochralski (CZ) puller
Cz pullers are offered in a very wide range of size and make.
It starts from laboratory system and ends with industrial high pressure machines. All known futures can be offered like crystal- and crucible-weighting system, symmetrical and asymmetrical rotation of crystal and crucible.
We produce systems with inductive heating or resistance heating. Different ceramics and crucible materials are available.
Lab Cz puller
21″ crucible with MF coil
Cz growth of BaF2
View of spindle
Multi blade saw
Dicing depth micrometer
Multi copper blade spindle with sample holder
CMP, polishing systems
CMP (chemical mechanical polishing) systems are offered in 1-, 2- and 4-stations systems.
A special bearing system is used to keep the polishing plate with the polishing pad non bowed.
The construction is a heavy build quality to avoid vibrations and deformations.
With this system all kind of materials can be polished to epitaxial quality.
Oxide materials (like Sapphire) can be polished up to 6” and a roughness of 0,5 lattice constant or better (for Sapphire e.g. 0,21 nm (ra) on a 10 x 10 µm AFM scan).
We offer also the needed technology for several materials to polish and also the needed carriers and tools.
CMP, polishing systems CQ
CMP and Diamond polishing system
Lab flame fusion systems and flame fusion puller
Electronics of flame
Mid scale flame
Crystal lowering system of flame fusion puller
Flame fusion furnace
Flame fusion system for Titanate crystals
Flame fusion system for transition metal oxides crystals
Lab flame fusion system
flame fusion puller
flame fusion puller
and open furnace
Open furnace with pistill
Floating zone pullers
Lab floating zone puller
with resistance heater
left part = transformer
right part = control system
Floating zone heater
at starting prozess
Zone floating heater type II
Semiconductor puller and Cool water-filter-system
Custom-made Semiconductor pullers are offered in various shapes and types. Most of them build as prototypes for later mass production. Different types of crystallisation are realised.
We offer also project consulting and material supply for the first tests. We use top grade materials, newest ceramics and finest electronics.
Our experience is 30 years of crystal growth system manufacturing and crystal growth.
Wafer etching systems
Wafer etching systems for e.g. GaN on Sapphire etching are standard products.
We offer glass reactors with electrical heater and stirring system. Reactor size is up to 100 l.
The systems are offered with different etching bathes and rinsing basins.
Please contact us for further details.
GaN etching reactors (2) made from glass with a 50 l phosphoric acid bath including heater and stirner.
The reactor has a leacage drum underneath.
In front of each reactor is a demi-water basin placed, to wash the etched substrates.
Wafer washing systems
High pressure pellet